AVI Photomask Metrology System

• SEM Accuracy or better
• Use on masks with or without pellicles
• Defect/line measurement down to 0.1 µ
• Contact measurement down to 0.3 µ

• Operates on binary or half-tone masks
• 5nm repeatability on hard / soft defects
• Measure defects while reviewing
• Operator-independent results

    The AVI sits next to your existing reticle inspection tool or other microscope, and uses its video signal to measure sizes accurately.

    In one second, the AVI’s patented Flux Area Measurement™ measures the amount of light the defect blocks or absorbs. Size is displayed as diameter or area.

    The defect measurements, image and information are saved to a database for later review and analysis.

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	DEFECTS: Down to 0.08 µ and smaller			CONTACT HOLES: 2-10 nm repeatability.
	LINE WIDTH: Down to 0.25 µ. 1-2 nm repeatability.			OPC: 2-10 nm repeatability (1 sigma)
	EDGE ROUGHNESS: 1-2 nm repeatability.			CORNER RADIUS: 2-10 nm repeatability.
	PITCH: 1 part in 1000			BUTTING ERROR: 1-2 nm repeatability.
	LARGE DEFECTS: Maximum dimension size

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 SEM accuracy or better: Measure defects / lines as small as 0.1 µm, contacts down to 0.3 µm.
 Excellent repeatability: 5 nm, or 1% of size, on hard and soft defects.
 Objective measurements: Get accurate, operator-independent results.
 Easy to use: Measure defects while reviewing; requires just one mouse-click.
 Fast: Highly reliable measurements in one second.
 Repair / reject fewer masks.
 Small Footprint: works with your existing reticle inspection system.
 Increases reticle inspection system throughput and utilization.
 Recover investment quickly: typical payback in only two months.

    Measures hard and soft defects:
          Diameter, Opacity, Height/Width, Max. Dimension
    Line width and butting error down to 0.1 µ
    Contact Size (Area)
    Edge and CD Uniformity (range and standard deviation)
    Corner Radius (absolute)
    OPC: Area, Separation, Asymmetry
    Built-in Statistics: Mean, Standard Deviation, Range

Operates on standard or phase-shift masks

Defect Size Range: 0.08 to 1.5 µ. Up to 100 µ depending on video source

Accuracy: 2% of defect size

Repeatability: 5 nm, or 1% of the defect size on defects 0.25 µ and larger. 7 nm for defects 0.08 µ to 0.25 µ.

Speed: 1-5 seconds per measurement

Compatibility: KLA3xx (including UV systems), KLA Starlight, KLA 2xx, Lasertec, DRS-I, DRS-II, KMS, Nikon, Probing Solutions, others on request

Calibration: Single-point calibration using a line pattern with known pitch.

Output: Screen, printout, email, spreadsheet and database

Defect Library: Images and measurements are stored in database for later review and analysis. Defect lists may be retrieved by customer, mask ID, comment, keyword, or date.

Equipment: Image processing computer; ethernet ready

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